The effect of ultrasonic vibration and surfactant additive on fabrication of 53.5 gr_mm silicon echelle grating with low surface roughness in alkaline KOH solution - 源码 - 源码 - 免费下载

The effect of ultrasonic vibration and surfactant additive on fabrication of 53.5 gr_mm silicon echelle grating with low surface roughness in alkaline KOH solution

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资源说明：In the silicon echelle grating fabrication process, the “pseudo-mask” formed by the hydrogen bubbles generated during the etching process is the reason causing high surface roughness and poor surface quality of blazed plane. Based upon the ultrasonic mechanical effect and contact angle reduced by surfactant additive, ultrasonic vibration, isopropyl alcohol (IPA) and 2,4,7,9-Tetramethyl-5-decyne-4,7-diol (TMDD) were used to improve surface quality of 53.5gr/mm echelle grating. The surface roughne

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