Effect of process conditions on the abrasion resistance of broadband AR films prepared by electron-beam evaporation - 源码 - 源码 - 免费下载

Effect of process conditions on the abrasion resistance of broadband AR films prepared by electron-beam evaporation

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资源说明：Until now, there are few reports on the effect of process conditions on abrasion resistance, which is the most important mechanical property of optical films. Broadband antireflective (AR) films composed of SiO2and TiO2, whose bands are from 620 to 860 nm and whose reflectivity is less than 0.5%, are prepared by electron-beam evaporation (EBE) at different temperatures, ion beam energies, and cooldown times. The structural properties of the films are investigated by atomic force microscopy, incl

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