Anti-reflection coating at 550 nm fabricated by atomic layer deposition - 源码 - 源码 - 免费下载

Anti-reflection coating at 550 nm fabricated by atomic layer deposition

文件大小： 602k

源码售价： 10 个金币积分规则积分充值

资源说明：Trimethylamine (TMA), TiCl4, and water are applied as the precursors to deposit Al2O3 and TiO2. With different substrate temperatures, the optical properties and surface morphologies of the two oxides TiO2 and SiO2 are studied, respectively. With substrate temperature of 120 oC, amorphous TiO2 can be obtained, and the surface roughness (RMS) is only 0.928 nm. Applying Al2O3 and TiO2 deposited in 120 oC as low and high refractive index materials, anti-reflection (AR) coating at single point (550

部分文件列表（点击文件名可查看文件内容）

					
									本源码包内暂不包含可直接显示的源代码文件，请下载源码包。